Single Crystal Growth

Device Fabrication

2-1 litho thumb.jpg

Photolithography System

2-4 Sputter thumb.jpg

Sputter

2-7 Furnace 2 thumb.jpg

High Temperature Furnace

2-2 Ebeam1 thumb.jpg

Electron Beam Evaporator 

2-5 RTA thumb.jpg

Rapid Thermal Annealing

2-3 Ebeam2 thumb.jpg

Electron Beam Evaporator 2

2-6 Furnace 1 thumb.jpg

Furnace

1-1 MOCVD Thumb.jpg

MOCVD

1-2 CVD 1 thumb.jpg

Thermal CVD 1

1-3 CVD 2 thumb.jpg

Thermal CVD 2

 
 

Characterization

3-1 OM thumb.jpg

Optical Microscopy

3-7 DUV thumb.jpg

 UV Enhanced OM

3-6 GC thumb.jpg

Gas Chromatography

3-2 Ellipso thumb.jpg

Ellipsometer

3-4 Probe thumb.jpg

Probe Station

3-3 Angle thumb.jpg

Angle Reflectivity Meas.

3-5 Chamber Probe thumb.jpg

Chamber Probe Station

 

CONTACT

Department of Materias Sicence and Engineering

Pohang University of Science and Technology (POSTECH)

 

77 Cheongam-Ro, Nam-gu, Pohang-si, Kyungsangbuk-do, Republic of Korea (37673) 

NPOL

NANOPHOTONICS AND OPTOELECTRONICS LAB

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